Tallinn University of Technology

Service description

The Chemical Vapor Deposition (CVD) system is used for preparation of different thin coatings. The system can be used also for the pre-triment and post-treatment of sample surface.

Laboratory of service

Laboratory of Physical Vapor Deposition


Vitali Podgurski

Service language

Estonian, English

Required info

Contact person: Vitali Podgurski, +372 620 3358